Europe style for Diode Laser Engraver - PS Series-Advanced Option – FEELTEK
Europe style for Diode Laser Engraver - PS Series-Advanced Option – FEELTEK Detail:
Application Video
Product Technical Information
Product line
Type | version | Weight(KG) | Size( mm) | Input voltage | Output Voltage(VDC) | Current(A) | Protocol |
PS10 PSH10 | Standard Version Pro.Version | 2.2 | 150x115x115 | 100V60HZ 220V50HZ | ±15 | 5 | XY2-100 Protocol |
PS15 PSH15 | Standard Version Pro.Version | 3.6 | 168x125x120 | ||||
PS20 PSH20 | Standard Version Pro.Version | 5.5 | 175x134x148.9 |
Optical Specifications
Type | Aperture size (mm) | Available Wavelength | Optical Material | Optical Surface |
PS10 PSH10 | 10 | 355 532 980/1064 9400 / 10640 | 1/4λ@633 Partly 1/8λ@633 | Si / Qu |
PS15 PSH15 | 15 | 355 532 980/1064 10640 | 1/4λ@633 | Si/SiC / Qu |
PS20 PSH20 | 20 | 355 532 980/1064 9400 / 10640 | 1/4λ@633 | Si/SiC / Qu |
Galvanometer Specifications
Type | PS10 (Standard Version ) | PSH10 (Standard Version ) | PS15 (Standard Version ) | PSH15 (Standard Version ) | PS20 (Standard Version ) | PSH20 (Standard Version ) |
Scan Angle(°) | ±11 | ±10 | ±10 | |||
Repeatability(urad) | 8 | 8 | 5 | 8 | 5 | |
Max.Gain Drift(ppm/k) | 100 | 50 | 50 | |||
Max.Offset Drift(urad/k) | 30 | 30 | 15 | |||
Long-term drift over 8h(mrad) | ≦0.15 | ≦0.1 | ≦0.1 | ≦0.1 | ||
Tracking Error(us) | <90 | <150 | <200 | |||
Step Response Time 1% of Full cale’(us) | <230 | <410 | <580 | |||
Typical Marking Speed²(m/s) | 7 | 5 | 4 | |||
Typical Positioning Speed²(m/s) | 20 | 15 | 14 | |||
Typical Character Marking³(cps) | 800CPS Good Quality 1000CPS Good Writing | 600CPS Good Quality 700CPS Good Writing | 650CPS Good Quality 750CPS Good Writing | 500CPS Good Quality 600CPS Good Writing |
1)1% step response 2)2D scanhead use F160 F-θ lens 3) F160 F-θ lens,1mm height single line character, LenMark software& FEELTEK control card
Mechanical Drawing
Product detail pictures:


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With a positive attitude of "regard the market, regard the custom, regard the science", the company works actively to do research and development. Hope we have a future business relationships and achieving mutual success.

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