2.5D Focus System
Alta sculptura, parva campi micro processui prioritate electionis pro micro-processus
CNC putamen, pulvis praeventionis, compages compacta, facile ad integrandum.
Libitum aquae refrigerationis consilium, potest applicari ad summus temperatus egisse requisita.
Modulationem latitudinis pulsus digitalis technologiam impellens adoptat, superiorem celeritatis responsionem possidet et temperatura inferiorem calliditate.
FE10
FE15
FE20
Highlight: EXERCITATIO, summa subtilitas markingle
Arx optica regitur et moderatur programmate, ore ruina efficaciter minuendo.
Focus dynamicus potest intellegere 3D superficiem applicationis.
Non opus est ad optical elevationem mechanicam, structuram simplicem, et facilem consequi automationem, efficientiam meliorem.
Princeps efficientiam
Axis dynamicus et axis XY plene ordinantur software, et emenda focus iacens in microseconds magna efficientia perficitur.
Magna cura
Cum transitus profunditatis processus, dynamicus axis coordinate componit focalem longitudinem et centrum maculae aptat in tempore reali, quod altius accurate consequi potest quam scanhead traditum.
Applicationem Highlight
●EXERCITATIO
●Sculptura
●Super cura notati
Speculum EXERCITATIO (varia figura)
Subtilitas vestigium
Durum materia alta sculptura
Sculptura (cultrum instrumentum)
Applicationem Video
Product Technical Information
| Items | Input intentione (VDC) | ±15 |
| Current(A) | 10A | |
| Protocol | XY2-100 Protocollum | |
| Refrigerationem Condition | Refrigerationem Media | Aqua destillata vel de-ionized plus corrosio inhibitor |
| Temperatus(°C) | 22-28 | |
| Commendatur refrigerationem pressura (bar) | 2-3 | |
| Commendatur fluxus rate (l/min) | 4-6 |
| Items | Output intentione (VDC) | ±15 |
| Current(A) | 10A | |
| Protocol | XY2-100 Protocollum | |
| Refrigerationem Condition | Refrigerationem Media | Aqua destillata vel de-ionized plus corrosio inhibitor |
| Temperatus(°C) | 22-28 | |
| Commendatur refrigerationem pressura (bar) | 2-3 | |
| Commendatur fluxus rate (l/min) | 4-6 |
| Productor linea | productum linea | FE10 | FE15 | FE20 |
| Pondus (KG) | 5.6 | 6.7 | 9 | |
| Magnitudo (mm) | 297* 125* 120 | 339* 125* 120 | 337* 134* 153.5 |
| Galvanometer Specifications | FE10 | FE15 | FE20 | ||||||
| Version | Standard | Pro | P2 | Standard | Pro | P2 | Pro | P2 | |
| Error tracking (MS) | ≤0.18 | ≤0.18 | ≤0.18 | ≤0.21 | ≤0.21 | ≤0.2 | ≤0.28 | ≤0.27 | |
| Repetitio (μrad) | 8 | 8 | 5 | 8 | 8 | 5 | 8 | 5 | |
| Temperatus egisse (μrad/k) | <100 | <100 | <50 | <100 | <100 | <50 | <100 | <50 | |
| Diu terminus summa (>24h, locus temperatus) (mrad) | ≤0.2 | ≤0.2 | ≤0.1 | ≤0.2 | ≤0.2 | ≤0.1 | ≤0.2 | ≤0.1 | |
| Max.processing celeritas (characteres / s) (qualis modus summus) | 600@100x100 | 650@100x100 | 500@100x100 | ||||||
| Temperatus operating (° C) | 25℃±10℃ | ||||||||
| FE10 Optical Specifications | Necem | 355nm | 532nm | 1064nm | ||
| Apertura Location(mm) | ≤10mm | ≤10mm | ≤10mm | |||
| Input magnificatio optiones | 2X | 2.66X | 2X | 2.66X | 1.16X | |
| Z profundum1) | ±5mm / ± 25mm | |||||
| FE15 Optical Specifications | Necem | 355nm | 532nm | 1064nm | ||
| Apertura Location(mm) | ≤15mm | ≤15mm | ≤15mm | |||
| Input magnificatio optiones | 2X | 2.66X | 2X | 2.66X | 1.66X | |
| Z profundum2) | ±5mm / ± 25mm | |||||
| FE20 Optical Specifications | Necem | 1064nm | ||||
| Apertura Location(mm) | ≤20mm | |||||
| Input magnificatio optiones | 2.1X | 2.57X | 2.66X | |||
| Z profundum3) | ±5mm | |||||
1), 2), 3) Longitudo focalis et brevis versio focalis pro option.
Mechanica Tractus
FE10
FE15
FE20
